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2011

Journal of Applied Physics, 109-10, 2011 doi:10.1063/1.3578341

Switching ultrastrong light-matter coupling on a subcycle scale

Huber R., Anappara A.A., Gnter G., Sell A., De Liberato S., Ciuti C., Biasiol G., Sorba L., Tredicucci A., Leitenstorfer A.
Journal of Physical Chemistry C, 115-14:6849 – 6854, 2011 doi:10.1021/jp200533a

Following the metalation process of protoporphyrin IX with metal substrate atoms at room temperature

González-Moreno Rubén, Sánchez-Sánchez Carlos, Trelka Marta, Otero Roberto, Cossaro Albano, Verdini Alberto, Floreano Luca, Ruiz-Bermejo Marta, García-Lekue Aran, Martín-Gago José Ángel, Rogero Celia
Physical Review B - Condensed Matter and Materials Physics, 83-13, 2011 doi:10.1103/PhysRevB.83.134422

Orbital topology interlayer spin coupling and magnetic anisotropy of the CuFeO2 compound

Malvestuto M., Bondino F., Magnano E., Lummen T.T.A., Van Loosdrecht P.H.M., Parmigiani F.
Philosophical Magazine, 91-13-15:1910 – 1916, 2011 doi:10.1080/14786435.2010.533136

The vibrational dynamics of GeO2 at the glass transition: A Raman and Brillouin scattering study

Rossi F., Baldi G., Caponi S., Dal Maschio R., Fontana A., Orsingher L., Zanatta M.
Journal of Nanoelectronics and Optoelectronics, 6-1:20 – 33, 2011 doi:10.1166/jno.2011.1130

Photoemission microscopy studies of quantum dots and rings

Biasiol Giorgio, Heun Stefan, Sorba Lucia
Journal of the American Chemical Society, 133-9:2801 – 2803, 2011 doi:10.1021/ja109663g

Tuning the morphology of gold clusters by substrate doping

Mammen Nisha, Narasimhan Shobhana, Gironcoli Stefano De
IEEE Journal on Selected Topics in Quantum Electronics, 17-4:794 – 800, 2011 doi:10.1109/JSTQE.2010.2068279

InGaAs/GaAs core-shell nanowires grown by molecular beam epitaxy

Jabeen Fauzia, Grillo Vincenzo, Martelli Faustino, Rubini Silvia
8077 (2011) doi:10.1117/12.886845

FEL multilayer optics damaged by multiple laser shots: Experimental results and discussion

Giglia A., Mahne N., Bianco A., Svetina C., Cucini R., Vysin L., Burian T., Juha L., Nannarone S.
Microelectronic Engineering, 88-8:2096 – 2099, 2011 doi:10.1016/j.mee.2011.01.018

Evaluation of a novolak based positive tone photoresist as NanoImprint Lithography resist

Pozzato Alessandro, Grenci Gianluca, Birarda Giovanni, Tormen Massimo
8078 (2011) doi:10.1117/12.886459

First results from the commissioning of the FERMI@Elettra free electron laser by means of the Photon Analysis Delivery and Reduction System (PADReS)

Zangrando M., Cudin I., Fava C., Gerusina S., Gobessi R., Godnig R., Rumiz L., Svetina C., Parmigiani F., Cocco D.
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